SPUTTERING MAGNETRONS

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Unbalanced magnetrons 300 mm Dual magnetron 3300 mm Target erosion
300 mm length unbalanced magnetrons with coaxial feedthrough
Installation of dual magnetron 3300 mm length
2200 mm length target erosion



Two magnetrons 650 mm length and ion source

Our planar linear sputtering magnetrons are intended for coating deposition by sputtering of conductive targets made of metals, alloys, and semiconductors in DC, pulsed unipolar and bipolar, and dual middle frecuency (MF) modes. We produce lab and industrial magnetrons from 250 to 3300 mm length with the following main options:

  • Magnetron installation: common single coaxial feedthrough or separate feedthroughs for operation gas, water, and power. Feedthrough(s) position on magnetron case also may differ.
  • Balanced or unbalanced magnetic system. Comparing with balanced magnetrons ionizing operation gas, unbalanced ones provide both operation gas and sputtered target material ionization and allow significantly improve quality of coatings deposited by reactive sputtering (nitrides, oxides, carbides, oxinitrides, and others).
  • Single-side magnetron with one target and double-side magnetron with two targets located on opposite magnetron sides.
  • Additional water cooling circuit of magnetron housing for heavy duty environment in a vacuum chamber or when a target is heated up to high temperature.
  • Enhanced magnetic field uniformity +/-1.5%.
  • Special design for sputtering of expensive or rare materials.
  • Work with "hot" targets (heated up to 900oC).
  • Operation gas supply: directly in a vacuum chamber volume or via the built-in gas distribution system.

Two magnetrons 650 mm length and linear anode layer ion source installed on the vacuum chamber door are shown on the left.

Magnetron with coaxial feedthrough may be installed in any suitable vacuum chamber hole. Its position may be corrected by moving along and rotation around magnetron/coaxial feedtrough axes. Coaxial feedthrough doesn't require additional electrical insulation and is electrically connected with the grounded coating machine frame (vacuum chamber).

Magnetrons with coaxial feedthrough and a single water cooling crcuit has coaxial feedthrough ⌀40 mm or 42 mm and supplied with a special design sealed flange or with Pfeiffer Vacuum flange DN40 ISO KF G1 1/2. Magnetrons with coaxial feedthrough and a double water cooling crcuit has coaxial feedthrough ⌀63 mm and supplied only with a special design sealed flange.

Magnetrons with water and electrical connections located on the back of magnetron case (on one side in case of a single water cooling circuit and on two opposite sides in case of double water cooling circuit) connected to the water and power supply lines using bellows or copper tubes with TEFLONTM insulation. Special design or standard vacuum flanges are used (for instance, Pfeiffer-Vacuum DN25 ISO-KF-G1 or DN16 ISO-KF-G1/2).

Water ad gas supply lines are connected to magnetrons tubes using push-in fittings Series MWO or MC of John Guest Ltd. for tubes ⌀10, 12, 15, 16, and 20 mm. Please contact us if you need other gas and water fittings.

The specially designed magnetrons are prodused for some special applications (for instance, high temperatures in a vacuum chamber, work with "hot" targets, expensive or rare target materials, temperature sensitive substrates to be coated, ITO coatings). There are:

  • Magnetrons with two water cooling circuits - target and housing;
  • Magnetrons with the heat shielded magnetic system and permanent magnets with enhanced temperature resistance;
  • Balanced magnetic system with enhanced target utilization and with combined target consisting of a base made of titanium or stainless steel and an insert to be sputtered made of expensive material. The insert utilization reaches 70%.

A deposition rate may be significantly increased for unbalanced magnetrons working with "hot" targets. In case of stainless steel deposition on a fixed substrate at power dencity 50 W/cm2, deposition rate with a "cold" target was 16 µm/hour, with a "hot" target - 26 µm/hour.

All magnetrons are protected by Russian Federation patents ## 2319788, 111138, 2522506, 121812.

These magnetrons as well as our linear ion sources successfully work in United Kingdom, Hungarian, Austrian, Italian, and Russian thin film coating companies.

We also produce coating machines for different applications. Here you can see a few of them equipped with our magnetrons and ion sources. Contact us to discuss you needs in detail.



Example of a magnetron Part Number to use when ordering:

M1UC-2-0900
M - Magnetron
1 - single-side magnetron, 2 - double-side magnetron
U - Unbalanced, B - Balanced magnetic system
C - Coaxial feedthrough, R - Regular feedthroughs
1 - single water cooling circuit (only target), 2 - double water cooling circuit (target and housing)
0900 - erosion zone length in mm

Balanced magnetrons
Operation pressure: 0.07 - 0.15 Pa
Operation gases All noble gases, oxygen, nitrogen, methane
Target erosion zone length from 250 mm to 2250 mm and more
Average ion energy up to 400 eV @ -500 V target potential
Current density per target erosion zone length unit @ erosion zone width 35 mm up to 120 mA/cm2
Power density in erosion zone up to 60 W/cm2
Magnetic field uniformity along the erosion zone +/-1.5%
Target utilization (depends on a target design) 35% - 70%
Unbalanced magnetrons
Operation pressure: 0.15 - 0.30 Pa
Operation gases All noble gases, oxygen, nitrogen, methane
Target erosion zone length from 250 mm to 3200 mm and more
Average ion energy up to 500 eV @ -650 V target potential
Current density per target erosion zone length unit @ erosion zone width 20 mm up to 100 mA/cm2
Power density in erosion zone up to 50 W/cm2
Magnetic field uniformity along the erosion zone +/-3%
Target utilization (depends on a target design) 20% - 40%
Deposition rate on rotating substrate at 120 mm distance from the target Ti - 3 µm/hour, Zr - 8 µm/hour
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VECOR 101 Duranzo Aisle, Irvine, CA92606, USA
Phone: +1-949-394-4466 * Fax: +1-949-451-6813 * E-mail: info@vecorus.com